Bilkent University Nanotechnology Center has a total of 250 square meter of class-100 level clean room for sub-micron lithography along with general-purpose electrical and optical characterization measurements. The center also has Metal Organic Chemical Vapor Deposition system (AIXTRON RF200/4 RF-S GaN/AlGaN MOCVD system), an epitaxy system that can be used for the growth of all GaN and related materials.  The   fabrication equipment includes Karl Suss mask aligner, e-beam evaporator, box-coater, sputter and profilometer.  The characterization equipment   includes PL, 50 GHz scope, OSA, Microwave spectrum analyzer, tunable fsec fiber lasers, tunable lasers, various fiber optic and optomechanical   components and instruments

 

 

MOCVD System  -  E-Beam Nanolithography  -  AFM System  -  Optical Measurements  Laboratory  -  
Electrical Measurements Laboratory  -  Microwave Measurements Laboratory

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